Semiconductor and Solar Equipment & Process Specialists


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                                        EQUIPMENT AND PROCESS SERVICES                       РУСКИЙ

                     HTE-USA technical team has broad experience in the Semiconductor, Solar
                  and Chemical industries and offers the following engineering services:
 

                  EQUIPMENT SUPPORT
                  1. RF/DC sputtering, CVD and Plasma Etch systems design, retrofit and installation
                  2. E-beam and thermal evaporator systems design, retrofit and installation
                  3. CMP and edge grinding systems refurbishing, retrofit and installation
                  4. Wet etch and plating systems design, retrofit and installation
                  5. Wet-clean systems design, retrofit and installation
                  6. Diffusion, Ink-Printing, IR Firing, RF Etch, AR Coating equipment5 for solar cells manufacturing
                  7. Surface defect analysis, troubleshooting and yield optimization equipment and systems
 


                  PROCESS SUPPORT
                  1. RF/DC sputtering, CVD and Plasma Etch process design, implementation and optimization
                  2. E-beam and thermal evaporation process design, implementation and optimization
                  3. W and Oxide CMP process design, and post-CMP cleaning process optimization
                  4. Wet etch, anodizing and plating processes implementation and optimization

                  5.  Diffusion, IR Firing, RF Etch, AR Coating for solar cells manufacturing
                  6. Wafers and parts cleaning processes: design, implementation and optimization

                  7. Surface defect analysis, troubleshooting and yield optimization processes and procedures  
 

                     Official Quotation will be generated within 48 hours from request.  Guaranteed!.... 

                      We'll pay commission and finder's fee for assistance with successful transactions......


             

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                                                                 Copyright © 2003-2004.    Last modified: 01/10/10.